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Nakanishi, Yasuo*; Wakahara, Akihiro*; Okada, Hiroshi*; Yoshida, Akira*; Oshima, Takeshi; Ito, Hisayoshi
Physica Status Solidi (B), 240(2), p.372 - 375, 2003/11
Times Cited Count:19 Percentile:65.52(Physics, Condensed Matter)Luminescence propeties of Tb-doped AlGaN were studied. The samples were grown on sapphire substrates using OMVPE. Tb implantation was cariied out to introduce Tb into samples. After implantation, samples were annealed at 1000 to 1150 C in 10% NH diluted with N. The luminescence intensity for AlGaN x=0.1 is 5 times stronger than that for x=0 at 14 K. The luminesecence intensity for GaN rapidly decreases with temperature and its activation enegy is 7.8 meV. With increasing Al content, the activation enegy increases, and the activation energy for AlGaN is 70 meV.
Kawano, Yasunori; Yoshino, Ryuji; Neyatani, Yuzuru; Nakamura, Yukiharu; Tokuda, Shinji; Tamai, Hiroshi
Fusion Science and Technology (JT-60 Special Issue), 42(2-3), p.298 - 314, 2002/09
Times Cited Count:13 Percentile:63.33(Nuclear Science & Technology)no abstracts in English